Internet Archive Search: creator:(Stephan Gerlach) AND -description:(Google)

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61 61

Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates

Sep 17, 2013 09/13

by Stefan Sellner; Alexander Gerlach; Stefan Kowarik; Frank Schreiber; Helmut Dosch; Stephan Meyer; Jens Pflaum; Gerhard Ulbricht

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We present a comparative study of the growth of the technologically highly relevant gate dielectric and encapsulation material aluminum oxide in inorganic and also organic heterostructures. Atomic force microscopy studies indicate strong similarities in the surface morphology of aluminum oxide films grown on these chemically different substrates. In addition, from X-ray reflectivity measurements we extract the roughness exponent \beta of aluminum oxide growth on both substrates. By...
Source: http://arxiv.org/abs/0711.5019v1

Arxiv.org

31 31

Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers

Sep 21, 2013 09/13

by Stefan Sellner; Alexander Gerlach; Frank Schreiber; Marion Kelsch; Nikolai Kasper; Helmut Dosch; Stephan Meyer; Jens Pflaum; Matthias Fischer; Bruno Gompf

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We show that the thermal stability of thin films of the organic semiconductor diindenoperylene (DIP) can be strongly enhanced by aluminum oxide capping layers. By thermal desorption spectroscopy and in-situ X-ray diffraction we demonstrate that organic films do not only stay on the substrate, but even remain crystalline up to 460C, i.e. 270 deg. above their desorption point for uncapped films (190C). We argue that this strong enhancement of the thermal stability compared to uncapped and also...
Source: http://arxiv.org/abs/cond-mat/0407588v1

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